HMDS Vapor Prime Oven, YES2 yes2 |
Exfab YES2 HMDS oven training 0.00 hours |
Wafer Prime (HMDS) |
All |
SNF Exfab Paul G Allen 104 Stinson |
Finetech Lambda flipchipbonder |
Flip Chip Bonder Training 1.00 hours |
Bonding |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
Nanospec 210XP nanospec2 |
Nanospec Training 0.25 hours |
Reflectometry |
All |
SNF Exfab Paul G Allen 104 Stinson |
Headway 3 Manual Resist Spinner headway3 |
Resist Coat (manual) Headway 3 Training 1.00 hours |
Resist Coat (manual) |
All |
SNF Exfab Paul G Allen 104 Stinson |
Profilometer Alphastep 500 alphastep |
Alphastep 500 Profilometer Training 0.25 hours |
Step Profile |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
Nanoscribe Photonics GT nanoscribe |
Nanoscribe Photonics GT Training 2.00 hours |
Patterning, 3D Printing |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
SEM -Zeiss Merlin sem-merlin |
SEM-Merlin Training 2.00 hours |
Microscopy |
All |
SNF Exfab Paul G Allen 104 Stinson |
Ex Fab Develop Wet Bench wbexfab_dev |
WbExfab_Dev Training 1.00 hours |
Resist Develop (manual), Wet Chemical Processing |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
Profilometer AlphaStep D-300 alphastep2 |
AlphaStep2 Training 0.25 hours |
Step Profile |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
Heidelberg MLA 150 heidelberg |
Heidelberg Training 2.00 hours |
Direct Write |
All |
SNF Exfab Paul G Allen 104 Stinson |
Keyence Digital Microscope VHX-6000 keyence |
Microscope Keyence Training 1.00 hours |
Microscopy |
All |
SNF Exfab Paul G Allen 104 Stinson |
Ex Fab Solvent Wet Bench wbexfab_solv |
WbExfab_Solv Training 0.50 hours |
Solvent Cleaning, Metal Lift-off, Wet Chemical Processing |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
Wet Bench Flexcorr 4 wbflexcorr-4 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours |
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oxford Dielectric Etcher oxford-rie |
Oxford Dielectric Etcher Training 1.00 hours |
Reactive Ion Etching (RIE) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
ASML PAS 5500/60 i-line Stepper asml |
Stepper ASML PAS 5500/60 i-line Training 4.00 hours |
Stepper |
All |
SNF Cleanroom Paul G Allen L107 |
SVG Resist Coat Track 2 svgcoat2 |
SVG Resist Coat Tracks 1 and 2 Training 1.25 hours |
Resist Coat (automatic) |
All |
SNF Cleanroom Paul G Allen L107 |
Heidelberg MLA 150 - 2 heidelberg2 |
Heidelberg Training 2.00 hours |
Direct Write |
All |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Tystar Atmospheric Tube Training 2.00 hours |
Oxide Growth (furnace) |
Clean |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Wet Bench Flexible Solvents 1 and 2 Training 0.50 hours |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Lam Research TCP 9400 Poly Etcher lampoly |
Lam Research TCP 9400 Poly Etcher Training 1.00 hours |
Inductively Coupled Plasma Etching (ICP) |
Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
EVG Contact Aligner evalign |
Contact Aligner EVG Training 1.50 hours |
Contact Aligner |
All |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Clean 2 wbclean-2 |
Wet Bench Clean1and2 Training 2.00 hours |
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing |
Clean |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 1 Tube 1 Anneal B1T1 Flexible Oxide |
Tystar Atmospheric Tube Training 2.00 hours |
Oxide Growth (furnace) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Wet Bench Flexible Solvents 1 and 2 Training 0.50 hours |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox |
Plasma Therm Versaline LL ICP Dielectric Etcher Training 1.50 hours |
Inductively Coupled Plasma Etching (ICP) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
RTA AllWin 610 aw610_r |
AllWin 610 RTA Training 1.00 hours |
Rapid Thermal Annealing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oxford Plasma Pro ICP-RIE Ox-gen |
Ox-gen etcher Training 1.50 hours |
Inductively Coupled Plasma Etching (ICP) |
Clean |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Decontamination wbdecon |
Wet Bench Decontamination Training |
Decontamination, Wet Chemical Processing |
Clean |
SNF Cleanroom Paul G Allen L107 |
SVG Develop Track 1 svgdev |
SVG Resist Develop tracks 1 and 2 Training 0.50 hours |
Resist Develop (automatic) |
All |
SNF Cleanroom Paul G Allen L107 |
RTA AllWin 610 aw610_l |
AllWin 610 RTA Training 1.00 hours |
Rapid Thermal Annealing |
Clean |
SNF Cleanroom Paul G Allen L107 |
SVG Develop Track 2 svgdev2 |
SVG Resist Develop tracks 1 and 2 Training 0.50 hours |
Resist Develop (automatic) |
All |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly |
Tystar LPCVD Tube Training 2.00 hours |
Low Pressure (LP) CVD |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Solvent Lithography lithosolv |
Lithography Solvent Bench Training |
Solvent Cleaning, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Laurell Manual Resist Spinner laurell-R |
Laurell Manual Resist Spinner Training 1.00 hours |
Resist Coat (manual) |
All |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 3 Tube 12 Poly B3T12 Clean Poly |
Tystar LPCVD Tube Training 2.00 hours |
Low Pressure (LP) CVD |
Clean |
SNF Cleanroom Paul G Allen L107 |
AMAT Centurion Epitaxial System epi2 |
Epitaxial AMAT Centurion Training 4.00 hours |
EPI (CVD), Low Pressure (LP) CVD, Hydrogen (H2) Annealing, Doping, Plasma Enhanced (PE) CVD |
Clean |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Clean_res-piranha wbclean_res-piranha |
Wet Bench Clean Piranha/HF/Phosphoric Training 2.25 hours |
Piranha Cleaning, Wet Resist Removal, Wet Chemical Processing |
Clean |
SNF Cleanroom Paul G Allen L107 |
EVG 101 Spray Coater evgspraycoat |
Spray Coater EVG 101 Training 1.50 hours |
Resist Spray Coat (manual) |
All |
SNF Cleanroom Paul G Allen L107 |
Reflectance Spectrometer Filmetrics F40 filmetrics |
Reflectance Spectrometer Filmetrics F40 Training |
Reflectometry |
All |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 3 Tube 10 Nitride B3T10 Clean Nitride |
Tystar LPCVD Tube Training 2.00 hours |
Low Pressure (LP) CVD |
Clean |
SNF Cleanroom Paul G Allen L107 |
Fiji 2 ALD fiji2 |
ALD Fiji 1 and 2 Training 2.00 hours |
Plasma Enhanced (PE) ALD |
Flexible |
SNF Cleanroom Paul G Allen L107 |
PlasmaTherm Shuttlelock PECVD System ccp-dep |
PlasmaTherm Shuttlelock PECVD System Training 1.00 hours |
Plasma Enhanced (PE) CVD |
All |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Flexcorr 3 wbflexcorr-3 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours |
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
SVG Resist Coat Track 1 svgcoat |
SVG Resist Coat Tracks 1 and 2 Training 1.25 hours |
Resist Coat (automatic) |
All |
SNF Cleanroom Paul G Allen L107 |
Technics Asher technics |
Technics Asher Training 0.50 hours |
Dry Resist Removal, Dry Etching |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 2 Tube 7 Nitride B2T7 Clean Nitride |
Tystar LPCVD Tube Training 2.00 hours |
Low Pressure (LP) CVD |
Clean |
SNF Cleanroom Paul G Allen L107 |
Fiji 3 ALD fiji3 |
ALD Fiji 3 Training 2.00 hours |
Plasma Enhanced (PE) ALD |
Flexible |
SNF Cleanroom Paul G Allen L107 |
PlasmaTherm Versaline HDP CVD System hdpcvd |
PlasmaTherm Versaline HDP CVD System Training 1.00 hours |
Plasma Enhanced (PE) CVD |
All |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Flexible Solvents wbflexsolv |
Wet Bench Flexible Solvents 1 and 2 Training 0.50 hours |
Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Flexible |
SNF Cleanroom Paul G Allen L107 |
SPTS uetch vapor etch uetch |
SPTS uetch vapor etch Training 0.50 hours |
Vapor Etching |
All |
SNF Cleanroom Paul G Allen L107 |
Nanospec 3 nanospec3 |
Nanospec 3 Training |
Reflectometry |
All |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 1 Tube 4 LTO B1T4 Flexible LTO |
Tystar LPCVD Tube Training 2.00 hours |
Low Pressure (LP) CVD |
Flexible |
SNF Cleanroom Paul G Allen L107 |
MVD mvd |
MVD Training 3.00 hours |
Thermal ALD |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Clean_res- hotphos wbclean_res-hotphos |
Wet Bench Clean Piranha/HF/Phosphoric Training 2.25 hours |
Silicon Nitride Wet Etching, Wet Chemical Processing |
Clean |
SNF Cleanroom Paul G Allen L107 |
Critical Point Dryer Tousimis Automegasamdri-936 cpd |
Critical Point Dryer Training 2.00 hours |
CO2 Drying, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Ultraviolet Photoresist Cure uvcure |
Ultraviolet Photoresist Cure Training |
Resist UV Cure |
All |
SNF Cleanroom Paul G Allen L107 |
Sensofar S-neox s-neox |
Sensofar S-neox Training 1.00 hours |
Optical Profilometer, Interferometry |
All |
SNF Cleanroom Paul G Allen L107 |
Samco PC300 Plasma Etch System samco |
Samco Training 0.50 hours |
Plasma Mode Etching, Reactive Ion Etching (RIE), Downstream/Remote Plasma Resist Removal |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 3 Tube 11 TEOS B3T11 Clean TEOS |
Tystar LPCVD Tube Training 2.00 hours |
Low Pressure (LP) CVD |
Clean |
SNF Cleanroom Paul G Allen L107 |
Savannah ALD savannah |
ALD Savannah Training 1.50 hours |
Thermal ALD |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours |
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Clean 1 wbclean-1 |
Wet Bench Clean1and2 Training 2.00 hours |
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing |
Clean |
SNF Cleanroom Paul G Allen L107 |
HMDS Vapor Prime Oven, YES yes |
YES Prime Oven Training |
Wafer Prime (HMDS), Singe |
All |
SNF Cleanroom Paul G Allen L107 |
Tencor P2 Profilometer p2 |
Tencor P2 Profilometer Training 0.50 hours |
Step Profile |
Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
Lesker2 Sputter lesker2-sputter |
Sputter Lesker 1&2 Training 1.00 hours |
Sputtering |
Semiclean |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 2 Tube 8 LTO B2T8 Clean LTO |
Tystar LPCVD Tube Training 2.00 hours |
Low Pressure (LP) CVD |
Clean |
SNF Cleanroom Paul G Allen L107 |
Woollam woollam |
Woollam Training 1.00 hours |
Ellipsometry |
All |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Flexcorr 2 wbflexcorr-2 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours |
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
MRC Reactive Ion Etcher mrc |
MRC Reactive Ion Etcher Training 1.00 hours |
Reactive Ion Etching (RIE) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oven (White) white-oven |
White Oven Training 0.50 hours |
Oven Bake |
Flexible |
SNF Cleanroom Paul G Allen L107 |
AJA2 Evaporator aja2-evap |
Evaporator AJA2 Training 1.00 hours |
Evaporation |
Flexible |
SNF Cleanroom Paul G Allen L107 |
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training 1.00 hours |
Evaporation |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Bench CMOS Metal wbclean3 |
Wet Bench CMOS Metal (wbclean3) Training |
Aluminum and Titanium and Tungsten Wet Etching, Wet Chemical Processing |
Semiclean |
SNF Cleanroom Paul G Allen L107 |
Gasonics Aura Asher gasonics |
Resist Removal Dry Gasonics Training |
Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
Oven BlueM 200°C to 430°C bluem |
Blue M Oven Training 0.50 hours |
Oven Bake |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Prometrix Resistivity Mapping System prometrix |
Prometrix Training 0.50 hours |
Sheet Resistance Measurement |
All |
SNF Cleanroom Paul G Allen L107 |
Fiji 1 ALD fiji1 |
ALD Fiji 1 and 2 Training 2.00 hours |
Plasma Enhanced (PE) ALD |
Semiclean |
SNF Cleanroom Paul G Allen L107 |
Headway Manual Resist Spinner headway2 |
Resist Coat (manual) Headway Manual Training 1.00 hours |
Resist Coat (manual) |
All |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training |
Resist Develop (manual), Wet Chemical Processing |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL |
Plasma Therm Versaline LL ICP Metal Etcher Training 1.50 hours |
Inductively Coupled Plasma Etching (ICP) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oven 110°C post-bake oven110 |
Resist Postbake Oven 110°C Training |
Resist Post Bake |
All |
SNF Cleanroom Paul G Allen L107 |
Flexus 2320 Stress Tester stresstest |
Stress Tester Flexus 2320 Training 0.75 hours |
Film Stress Measurement |
All |
SNF Cleanroom Paul G Allen L107 |
AMAT P5000 Etcher p5000etch |
Dry Etcher AMAT P5000 Training 1.00 hours |
Magnetically Enhanced RIE (MERIE) |
Clean, Clean (Ge), Semiclean |
SNF Cleanroom Paul G Allen L107 |
Mask Scrubber masksrub |
Mask Scrubber Training |
Mask Cleaning (manual), Wet Chemical Processing |
All |
SNF Cleanroom Paul G Allen L107 |
Matrix Plasma Resist Strip matrix |
Matrix Plasma Resist Strip Training 0.50 hours |
Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oven 90°C prebake oven90 |
Resist Prebake Oven 90°C Training |
Resist Prebake |
All |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 1 Tube 2 B1T2 Flexible Oxide |
Tystar Atmospheric Tube Training 2.00 hours |
Oxide Growth (furnace), Annealing (furnace) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oxford III-V etcher Ox-35 |
Oxford III-V etcher Training 1.50 hours |
Inductively Coupled Plasma Etching (ICP) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip 0.75 hours |
Wet Resist Removal, Wet Chemical Processing |
Clean (Ge), Semiclean, Flexible |
SNF Cleanroom Paul G Allen L107 |
Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training 0.50 hours |
Vapor Etching |
All |
SNF Cleanroom Paul G Allen L107 |
Karl Suss MA-6 Contact Aligner karlsuss2 |
Contact Aligner Karl Suss MA-6 Training 1.50 hours |
Contact Aligner |
All |
SNF Cleanroom Paul G Allen L107 |
Intlvac Evaporator Intlvac_evap |
Evaporator Intlvac Training 2.00 hours |
Evaporation |
Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 2 Tube 5 B2T5 Clean Anneal |
Tystar Atmospheric Tube Training 2.00 hours |
Oxide Growth (furnace) |
Clean |
SNF Cleanroom Paul G Allen L107 |
Wet Bench Clean_res-hf wbclean_res-hf |
Wet Bench Clean Piranha/HF/Phosphoric Training 2.25 hours |
Silicon Oxide Wet Etching, Wet Chemical Processing |
Clean |
SNF Cleanroom Paul G Allen L107 |
Plasma Therm Versaline LL ICP Deep Silicon Etcher PT-DSE |
Plasma Therm Versaline LL ICP Deep Silicon Etcher Training 1.50 hours |
Inductively Coupled Plasma Etching (ICP) |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Karl Suss MA-6 Contact Aligner karlsuss |
Contact Aligner Karl Suss MA-6 Training 1.50 hours |
Contact Aligner |
All |
SNF Cleanroom Paul G Allen L107 |
Tystar Bank 2 Tube 6 B2T6 Clean Oxide |
Tystar Atmospheric Tube Training 2.00 hours |
Oxide Growth (furnace) |
Clean |
SNF Cleanroom Paul G Allen L107 |
Asylum AFM afm-asylum |
AFM Asylum Training 4.00 hours |
Atomic Force Microscopy (AFM) |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
Solidscape Wax 3D Printer 3d-wax-printer |
Solidscape 3D Wax Printer Training |
3D Printing |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
micromanipulator6000 IV-CV probe station micromanipulator6000 |
micromanipulator6000 IV-CV probe station Training 0.50 hours |
Characterization |
All |
SNF Exfab Paul G Allen 151 Ocean |
Jasco UV-Vis-NIR jasco-uv-vis-nir |
Jasco UV-Vis-NIR Training |
Characterization |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
Lakeshore Hall Measurement System LakeshoreHall |
Lakeshore Hall Measurement System training 3.00 hours |
Sheet Resistance Measurement, Hall measurement |
All |
SNF Exfab Paul G Allen 151 Ocean |
Sinton Lifetime Tester sinton-lifetime-tester |
Sinton Lifetime Tester Training 1.00 hours |
Minority Carrier Characterization |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
CytoViva HSI cytoviva |
Cytoviva Training 0.00 hours |
Characterization |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
Alveole Primo alveole |
Protein patterning Alveole Primo Training 2.00 hours |
Protein patterning |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
Voltera voltera |
Voltera Training |
Patterning, Ink |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
LEI1500 Contactless Sheet Resistance Mapping Training 1.00 hours |
Sheet Resistance Measurement |
All |
SNF Exfab Paul G Allen 151 Ocean |
Xplore Micro Compounder N/A |
Micro Compounder training 0.00 hours |
Other |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
DISCO Wafer Saw DISCO wafersaw |
Wafersaw DISCO training 2.00 hours |
Wafer Saw |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
CMP GnP POLI-400L cmp |
CMP POLI-400L Training 1.50 hours |
Wafer Polishing |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
DISCO Backgrinder disco-backgrind |
Backgrinder DISCO Training 2.00 hours |
Machining |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
AJA Evaporator aja-evap |
Evaporator AJA training 1.00 hours |
Evaporation |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
Epilog Fusion M2 Laser Cutter lasercutter |
Lasercutter Epilog Fusion M2 Training 1.00 hours |
Laser Cutting |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
Oriel Deep UV Exposure Lamp oriel-duv |
Oriel DUV Training |
Other |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
Lesker Sputter lesker-sputter |
Sputter Lesker 1&2 Training 1.00 hours |
Sputtering |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
Optomec Printer optomec-printer |
Optomec Printer Training 14.00 hours |
Ink |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
First Nano carbon nanotube CVD furnace cvd-nanotube |
cvd-nanotube training 3.00 hours |
Carbon Nanotube CVD Growth |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
CVD graphene furnace Aixtron Black Magic training 1.00 hours |
Graphene CVD Growth |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Hummer V Sputter Coater hummer |
Hummer V Sputter Coater Training 1.00 hours |
Sputtering |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training 4.00 hours |
Metal-Organic (MO) CVD |
Flexible |
SNF MOCVD Paul G Allen 213XA |
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training 4.00 hours |
Metal-Organic (MO) CVD |
Clean (MOCVD) |
SNF MOCVD Paul G Allen 213XA |
Plasmaetch PE-50 plasma-etch |
Plasmaetch PE-50 Training 0.50 hours |
Reactive Ion Etching (RIE) |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Fumehood 3 fumehood3 |
Fumehood 3 Training 0.00 hours |
Controlled Environment |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Biologic SP-300 biologic |
Potentiostat BioLogic Training |
Characterization, Other |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Fumehood 4 fumehood4 |
Fumehood 4 Training 0.00 hours |
Controlled Environment |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Fisher Accuspin 24C centrifuge |
Centrifuge Training |
Centrifugation |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
PDMS Spin Coater spincoat-g3p8 |
PDMS Spin Coater Training 0.00 hours |
Patterning |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Ika T18 Disperser disperser |
IKA Disperser Training |
Sonication |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Thermoscientific Oven thermoscientific-oven |
Thermoscientific Oven Training 0.00 hours |
Other |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
QSonica Q700 Sonicator sonicator |
Probe Sonicator Training |
Sonication |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
PDMS Hotplate hotplate-1 |
PDMS Hotplate Training 0.00 hours |
Other |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
PDMS Workbench |
PDMS Workbench Training |
Deposition |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Fujifilm Dimatix Ink Jet Printer nanoinkjet |
Ink Jet Printer Dimatix Training 7.00 hours |
Ink |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Minitech-GX Micromill micromill |
Micromill Training 1.00 hours |
Micromilling |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls |
Malvern Dynamic Light Scattering (DLS) Zetasizer Training |
Dynamic Light Scattering |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Glovebox-l glovebox-l |
Glovebox-l Training |
Controlled Environment |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Formlabs Form2 3D Printer form2-3d-printer |
3D Printer Form2 Training |
3D Printing |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Thinky AR-100 Mixer thinky-mixer |
Thinky Mixer Training |
Other |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Parylene Coater Training 3.00 hours |
Deposition |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Fumehood 1 fumehood1 |
Fumehood 1 Training |
Controlled Environment |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Glovebox-r glovebox-r |
Glovebox-r Training |
Controlled Environment, Material Transfer |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Fumehood 2 fumehood2 |
Fumehood 2 Training 0.00 hours |
Controlled Environment |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
SPF Measurement Bench |
SPF Measurement Bench Training |
Characterization |
|
SNF SPF Paul G Allen 138 SPF |