Overview
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Material Thickness Range:
0.0
mm
35.0
mm
Process Temperature Range:
Characterization Specifications
Sample Size Limits:
6 in wafer
Substrate Type
Substrate Sizes
Maximum Load:
one
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
NEMO ID:
sem-merlin
Training and Maintenance
Lab Facility:
Training Charges:
2.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Steps to become a tool user
Become a member of nano@stanford.
Become a member of SNF.
Shadow another user on the SEM-Merlin for the first 30 minutes of operation or be qualified on a SNSF SEM
- Study the relevant operating procedures:
- Contact the primary trainer: Cliff Knollenberg
Notes:
We want users to have a basic understanding of SEM components and basic operation before a more detailed training session, so were asking them to shadow another user on the SEM-Merlin for the first 30 minutes of operation or be qualified on a SNSF SEM.