EPI (CVD), Low Pressure (LP) CVD, Hydrogen (H2) Annealing, Doping, Plasma Enhanced (PE) CVD |
AMAT Centurion Epitaxial System epi2 |
Deposit epitaxial and polycrystalline silicon, germanium and silicon-germanium films.
|
Clean |
SNF Cleanroom Paul G Allen L107 |
Rapid Thermal Annealing |
RTA AllWin 610 aw610_l |
|
Clean |
SNF Cleanroom Paul G Allen L107 |
Rapid Thermal Annealing |
RTA AllWin 610 aw610_r |
|
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oxide Growth (furnace) |
Tystar Bank 1 Tube 1 B1T1 Flexible Oxide |
|
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oxide Growth (furnace), Annealing (furnace) |
Tystar Bank 1 Tube 2 B1T2 Flexible Oxide Anneal |
|
Flexible |
SNF Cleanroom Paul G Allen L107 |
Oxide Growth (furnace) |
Tystar Bank 2 Tube 5 B2T5 Clean Oxide Anneal |
|
Clean |
SNF Cleanroom Paul G Allen L107 |
Oxide Growth (furnace) |
Tystar Bank 2 Tube 6 B2T6 Clean Oxide |
|
Clean |
SNF Cleanroom Paul G Allen L107 |
Oxide Growth (furnace) |
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
|
Clean |
SNF Cleanroom Paul G Allen L107 |