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Stanford Nanofabrication Facility
Lab User Guide

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  • Guide Home
    • Guide Home Overview
    • Lab Spaces
    • Visit
      • Lab Attire
    • How to Join
    • Contacts and Emergency
    • Rates
    • Storage
    • History
  • Techniques
    • Overview
    • Processing Techniques
    • Projects
      • Fab Project Courses: E241 & EE412
      • Community Service Projects
      • nano@stanford Fellowship Projects
    • Nano Nuggets
    • Processes
      • Device Process Courses: EE410 and EE312
    • Runsheets
  • Safety & Policies
    • Overview
    • SNF Lab Manual, link to google doc
    • SNF Lab Manual
      • SNF Lab Manual
    • Safety Training
    • SDS
    • Gowning lab specific
    • Garment checkout for Cleanroom L107
    • Gowning Procedure for Cleanroom L107
    • Mavericks (ExFab Room 155) Policies
    • Prescription Safety Glasses
  • Training
    • Overview/Equipment List
    • Training Course Online
    • Upcoming Training, link to NEMO
    • Training Shadowing Form
    • Training Videos
    • All Litho class
  • Materials
    • Overview
      • Chemicals & Materials
    • Cleanliness Groups
      • "All" List of Tools
      • "Clean" List of Tools
        • "Clean-Ge" List of Tools
        • "Clean (MOCVD)" List of Tools
        • "Semiclean" List of Tools
      • "Flexible" List of Tools
    • New Process or Material Requests (PROM)
      • ProM Committee
      • ProM Approach
      • TMAH Protocols
        • TMAH Checklist
      • PROM (PRocess and Materials) Form
      • PROM archive view
    • Chemicals List
      • Acids
      • Bases
      • Developers
      • Metal Etchants
      • Other Chemicals
      • Primer
      • Resists
      • Solvents
    • Substrate Types and Sizes
    • Materials List
    • Gases List
  • Useful Links
    • Run NEMO (login required)
    • NEMO User Guide
    • External Links
    • Wafer Dopant and Resistivity Specs
    • Face shield cleaning using steamer
    • Tool Monitoring
  • Emergency and People
    • For Emergencies
    • Staff List
    • Consultants
    • Process Staff Liaisons
  • Equipment
    • Equipment Name Table
    • Characterization (link to Processing Techniques)
    • CVD (link to Processing Techniques)
      • MOCVD Equipment
      • ALD Equipment
      • PECVD Equipment
      • LPCVD Equipment
    • Doping (link to Processing Techniques)
    • Dry Etch (link to Processing Techniques)
      • RIE Etchers
      • Vapor Etchers
      • CCP Etchers
      • Downstream Plasma Etchers
      • ICP Etchers
      • Legacy Dry Etch Equipment Overview
    • Metallization (link to Processing Techniques)
    • Oxidation and Annealing (link to Processing Techniques)
    • Photolithography (link to Processing Techniques)
      • Lithography Oven Equipment
      • Resist Coat Equipment
      • Resist Develop Equipment
      • Resist Exposure Equipment
    • Wet Chemical Processing (link to Processing Techniques)

Techniques

  • Overview
  • Processing Techniques
  • Projects
    • Fab Project Courses: E241 & EE412
    • Community Service Projects
    • nano@stanford Fellowship Projects
  • Nano Nuggets
  • Processes
    • Device Process Courses: EE410 and EE312
  • Runsheets

Processes

List of Processes

Dry Etching: Attaching Samples to Carrier Wafers for Dry Etching or Deposition
Dry Resist Stripping, Descum and Polymer Removal Processes, Link to Processing Technique Dry Etching
Photoresist Stripping Options vs. Cleanliness Level, Link to Processing Technique Resist Removal
Tweezers Cleaning
Wet Cleaning: Standard Pre-Diffusion Clean for Oxidation (SC1/HF dip/SC2) of Non-Metal Wafers (clean)
Wet Cleaning: Standard Pre-LPCVD or Pre-Metal Clean’ for LPCVD or Metal Deposition (SC1/SC2/HF dip) of Non-Metal Wafers (clean)
Last modified: 11 Aug 2025
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