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Characterization

Characterization is a broad term that is used to describe any method of analysis of properties of materials and devices. The various tools listed here will use different techniques to study a wide variety of properties.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Atomic Force Microscopy (AFM)	Asylum AFM afm-asylum	Atomic force microscopy.	Flexible	SNF Exfab Paul G Allen 151 Ocean
Characterization, Other	Biologic SP-300 biologic	SP-300 is a 500 mA to 10 A research grade potentiostat/galvanostat/EIS with 7 mHz max frequency, floating mode, analog filtering, built-in calibration board, and stability bandwidths.	Flexible	SNF Exfab Paul G Allen 155 Mavericks
Characterization	CytoViva HSI cytoviva		Flexible	SNF Exfab Paul G Allen 151 Ocean
Film Stress Measurement	Flexus 2320 Stress Tester stresstest	Film stress and wafer curvature measurement.	All	SNF Cleanroom Paul G Allen L107
Characterization	Jasco UV-Vis-NIR jasco-uv-vis-nir		Flexible	SNF Exfab Paul G Allen 151 Ocean
Microscopy	Keyence Digital Microscope VHX-6000 keyence	Microscopy	All	SNF Exfab Paul G Allen 104 Stinson
Sheet Resistance Measurement, Hall measurement	Lakeshore Hall Measurement System LakeshoreHall	Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current	All	SNF Exfab Paul G Allen 151 Ocean
Sheet Resistance Measurement	LEI1500 Contactless Sheet Resistance Mapping eddycurrent	Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current	All	SNF Exfab Paul G Allen 151 Ocean
Dynamic Light Scattering	Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls		Flexible	SNF Exfab Paul G Allen 155 Mavericks
Characterization	micromanipulator6000 IV-CV probe station micromanipulator6000		All	SNF Exfab Paul G Allen 151 Ocean
Reflectometry	Nanospec 210XP nanospec2	Non-contact, spectro-reflectometry to measure the thickness of transparent films > 300 Ã (up to two) on substrates, such as silicon, that are reflective in the visible range.	All	SNF Exfab Paul G Allen 104 Stinson
Reflectometry	Nanospec 3 nanospec3		All	SNF Cleanroom Paul G Allen L107
Step Profile	Profilometer Alphastep 500 alphastep	Surface profiler measures step heights from 500 Å to 300 µm on materials in the flexible cleanliness group.	Flexible	SNF Exfab Paul G Allen 104 Stinson
Step Profile	Profilometer AlphaStep D-300 alphastep2	A stylus-based (tip radius 2 microns) surface profiler that measures step heights from 50nm to 300 µm on materials.	Flexible	SNF Exfab Paul G Allen 104 Stinson
Sheet Resistance Measurement	Prometrix Resistivity Mapping System prometrix	Contact sheet resistance mapping system for 2"up to 8" wafers.	All	SNF Cleanroom Paul G Allen L107
Reflectometry	Reflectance Spectrometer Filmetrics F40 filmetrics		All	SNF Cleanroom Paul G Allen L107
Microscopy	SEM -Zeiss Merlin sem-merlin	Mid-Range SEM for inspection of wafer defects, etch depths, and lithography overlay.	All	SNF Exfab Paul G Allen 104 Stinson
Optical Profilometer, Interferometry	Sensofar S-neox s-neox	3D optical profiler combining confocal, interferometry, and focus variation techniques to measure the surface height of smooth to very rough, ideally reflecting surfaces.	All	SNF Cleanroom Paul G Allen L107
Minority Carrier Characterization	Sinton Lifetime Tester sinton-lifetime-tester		Flexible	SNF Exfab Paul G Allen 151 Ocean
Characterization	SPF Measurement Bench			SNF SPF Paul G Allen 138 SPF

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Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Material Thickness Range	Substrate Size	Maximum Load (number of wafers)	Process Temperature Range	Notes
Atomic Force Microscopy (AFM)	Asylum AFM afm-asylum	Flexible		Pieces 2" 3"
Characterization, Other	Biologic SP-300 biologic	Flexible
Characterization	CytoViva HSI cytoviva	Flexible
Film Stress Measurement	Flexus 2320 Stress Tester stresstest	All		3" 4" 6" 8"	1
Characterization	Jasco UV-Vis-NIR jasco-uv-vis-nir	Flexible
Microscopy	Keyence Digital Microscope VHX-6000 keyence	All		Pieces 2" 3" 4" 6"
Sheet Resistance Measurement, Hall measurement	Lakeshore Hall Measurement System LakeshoreHall	All	100.00 μm - 1000.00 μm	Pieces	1 piece	-258 °C - 1000 °C
Sheet Resistance Measurement	LEI1500 Contactless Sheet Resistance Mapping eddycurrent	All		2" 3" 4" 6" 8"	1 wafer(2" to 8")
Dynamic Light Scattering	Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls	Flexible		Pieces Other
Characterization	micromanipulator6000 IV-CV probe station micromanipulator6000	All		Pieces 2" 3" 4"	1x4" wafer
Reflectometry	Nanospec 210XP nanospec2	All		Pieces 2" 3" 4" 6"			Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã
Reflectometry	Nanospec 3 nanospec3	All		Pieces 2" 3" 4" 6"
Step Profile	Profilometer Alphastep 500 alphastep	Flexible		Pieces 2" 3" 4" 6"	1		500Å to 300µm
Step Profile	Profilometer AlphaStep D-300 alphastep2	Flexible		Pieces 2" 3" 4" 6"	1
Sheet Resistance Measurement	Prometrix Resistivity Mapping System prometrix	All		2" 3" 4" 6" 8"	1		3 Probe Heads for different cleanliness groups.
Reflectometry	Reflectance Spectrometer Filmetrics F40 filmetrics	All			one piece or wafer
Microscopy	SEM -Zeiss Merlin sem-merlin	All	0.00 mm - 35.00 mm	Pieces 2" 3" 4" 6" Disks
Optical Profilometer, Interferometry	Sensofar S-neox s-neox	All		Pieces 2" 3" 4" 6" 8"	1		non contact 3D optical profiling
Minority Carrier Characterization	Sinton Lifetime Tester sinton-lifetime-tester	Flexible		Pieces 2" 3" 4" 6"
Characterization	SPF Measurement Bench

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