Flexus 2320 Stress Tester (stresstest)
Overview
The Flexus 2320 determines wafer curvature by measuring the angle of deflection of a laser beam off the surface of the substrate. Film stress is determined by comparing the change in radius of curvature of the substrate, with and without the film. This means that the substrate and the film must be optically reflective in the wavelength used. Because semi-transparent films may absorb light (depending on the incident wavelength/angle and the film thickness/RI) the Flexus 2320 has two wavelengths (670 nm and 750 nm).
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Substrate Type
Substrate Sizes
Maximum Load:
1
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Characterization and Testing
NEMO ID:
stresstest
Training and Maintenance
Lab Facility:
Training Charges:
0.75 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Cliff Knollenberg
