Skip to content
Skip to navigation
Stanford Nanofabrication Facility
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Guide Home
Guide Home Overview
Lab Spaces
Techniques
Overview
Processing Techniques
Projects
Fab Project Courses: E241 & EE412
Community Service Projects
nano@stanford Fellowship Projects
Nano Nuggets
Processes
Runsheets
Safety & Policies
Overview
SNF Lab Manual
Safety Training
SDS
Gowning lab specific
Garment checkout for Cleanroom L107
Gowning Procedure for Cleanroom L107
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
Training
Overview/Equipment List
Training Course Online
Upcoming Training, link to NEMO
Training Shadowing Form
Training Videos
All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
"All" List of Tools
"Clean" List of Tools
"Clean-Ge" List of Tools
"Clean (MOCVD)" List of Tools
"Semiclean" List of Tools
"Flexible" List of Tools
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
Acids
Bases
Developers
Metal Etchants
Other Chemicals
Primer
Resists
Solvents
Substrate Types and Sizes
Substrate Sizes
Materials List
Gases List
Useful Links
Run NEMO (login required)
NEMO User Guide
External Links
Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
Tool Monitoring
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Gary Sosa
Contact Information
Phone:
(650)725-1685
Office:
Paul G. Allen 158
Email:
gsosa@stanford.edu
About
Role:
Maintenance Engineer - Litho
Lithography Area/Wet Benches/Characterization
Trainer for
Oriel Deep UV Exposure Lamp (oriel-duv)
Maintainer for
ASML PAS 5500/60 i-line Stepper (asml)
CytoViva HSI (cytoviva)
EVG 101 Spray Coater (evgspraycoat)
Ex Fab Develop Wet Bench (wbexfab_dev)
Ex Fab Solvent Wet Bench (wbexfab_solv)
Flexus 2320 Stress Tester (stresstest)
Headway 3 Manual Resist Spinner (headway3)
HMDS Vapor Prime Oven, YES2 (yes2)
Hummer V Sputter Coater (hummer)
Karl Suss MA-6 Contact Aligner (karlsuss)
Karl Suss MA-6 Contact Aligner (karlsuss2)
Nanospec 210XP (nanospec2)
Nanospec 3 (nanospec3)
Oriel Deep UV Exposure Lamp (oriel-duv)
Profilometer AlphaStep D-300 (alphastep2)
Prometrix Resistivity Mapping System (prometrix)
Reflectance Spectrometer Filmetrics F40 (filmetrics)
SEM -Zeiss Merlin (sem-merlin)
Sensofar S-neox (s-neox)
SVG Develop Track 1 (svgdev)
SVG Develop Track 2 (svgdev2)
SVG Resist Coat Track 1 (svgcoat)
SVG Resist Coat Track 2 (svgcoat2)
Woollam (woollam)
Backup maintenance for
DISCO Wafer Saw (DISCO wafersaw)
Headway Manual Resist Spinner (headway2)
HMDS Vapor Prime Oven, YES (yes)
Laurell Manual Resist Spinner (laurell-R)
Optomec Printer (optomec-printer)
Oven (White) (white-oven)
Oven 110°C post-bake (oven110)
Oven 90°C prebake (oven90)
Oven BlueM 200°C to 430°C (bluem)
Profilometer Alphastep 500 (alphastep)
Ultraviolet Photoresist Cure (uvcure)
Wet Bench Clean 1 (wbclean-1)
Wet Bench Clean 2 (wbclean-2)
Wet Bench Clean_res- hotphos (wbclean_res-hotphos)
Wet Bench Clean_res-hf (wbclean_res-hf)
Wet Bench Clean_res-piranha (wbclean_res-piranha)
Wet Bench CMOS Metal (wbclean3)
Wet Bench Decontamination (wbdecon)
Wet Bench Flexcorr 1 (wbflexcorr-1)
Wet Bench Flexcorr 2 (wbflexcorr-2)
Wet Bench Flexcorr 3 (wbflexcorr-3)
Wet Bench Flexcorr 4 (wbflexcorr-4)
Wet Bench Flexible Solvents (wbflexsolv)
Wet Bench Flexible Solvents 1 (wbflexsolv-1)
Wet Bench Flexible Solvents 2 (wbflexsolv-2)
Wet Bench Miscellaneous (wbmiscres)
Wet Bench Resist Strip (wbresstrip-1)
Wet Bench Solvent Lithography (lithosolv)