Wet Bench Flexcorr 3 (wbflexcorr-3)
Overview
This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible) materials like glass, wafer pieces, devices with gold or non-standard metals. It is also used for non-CMOS compatible processing, such as KOH etching. With the appropriate, dedicated glassware, KOH cleanup can be done to decontaminate wafers for later CMOS-compatible processing.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Chemicals
Substrate Type
Substrate Sizes
Notes:
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Wet Benches
NEMO ID:
wbflexcorr-3
Training and Maintenance
Lab Facility:
Training Charges:
2.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- For upcoming training check the Training dashboard (login required).
- Contact the primary trainer: Uli Thumser
