Acids and bases (as opposed to solvents, for example) are used in wet benches that have been set up to allow safe chemical usage. The equipment you will need will depend on the chemistry, your substrate size, and the Cleanliness group (formerly Contamination group).

Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Location
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing Wet Bench Flexcorr 1
wbflexcorr-1

Manual wet etching of non-standard materials using only SNF approved acids or bases. Hot plate available. GaAs allowed in personal labware only.

 Flexible SNF Paul G Allen L107 Cleanroom
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing Wet Bench Flexcorr 2
wbflexcorr-2

Manual wet etching of non-standard materials using only SNF approved acids or bases. Hot pots available. GaAs allowed in personal labware only.

 Flexible SNF Paul G Allen L107 Cleanroom
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing Wet Bench Flexcorr 3
wbflexcorr-3

Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.

 Flexible SNF Paul G Allen L107 Cleanroom
Acid or Base Wet Etching, Piranha Cleaning, Wet Chemical Processing Wet Bench Flexcorr 4
wbflexcorr-4

Manual wet etching of non-standard materials using acids or bases. Hot plate, HF bath, and controlled temperature bath available. GaAs not allowed.

 Flexible SNF Paul G Allen L107 Cleanroom