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Stanford Nanofabrication Facility
Lab User Guide

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Materials

  • Overview
    • Chemicals & Materials
  • Cleanliness Groups
    • "All" List of Tools
    • "Clean" List of Tools
      • "Clean-Ge" List of Tools
      • "Clean (MOCVD)" List of Tools
      • "Semiclean" List of Tools
    • "Flexible" List of Tools
  • New Process or Material Requests (PROM)
    • ProM Committee
    • ProM Approach
    • TMAH Protocols
      • TMAH Checklist
    • PROM (PRocess and Materials) Form
    • PROM archive view
  • Chemicals List
    • Acids
    • Bases
    • Developers
    • Metal Etchants
    • Other Chemicals
    • Primer
    • Resists
    • Solvents
  • Substrate Types and Sizes
  • Materials List
  • Gases List

Chemicals List

These are the chemicals (commmon name and chemical formula) provided for lab users. If you would like to use other chemicals, please consult the PROM Committee.

Acids

20:1 BOE (38% NH4F, 2% HF, 60% H2O)
50:1 HF (50:1 HF)
6:1 BOE (34% NH4F, 7% HF, 59% H2O)
9:1 Piranha (9:1 H2SO4:H2O2)
SC1 (5:1:1 H2O:H2O2:NH4OH)
SC2 (H2O:H2O2:HCl (5:1:1))

Metal Etchants

Al-Etch
Chrome Etch
Gold Etchant
Ti-Etch (H2O2)
W-etch (H2O2)

Developers

AZ 1:1
MF-26A developer

Resists

AZ5214IR
LOL
LOR
PMMA ((C5O2H8)n)
Shipley 3612 resist
SPR 955 CM-.7 resist
SPR220-3 resist
SPR220-7
SU-8

Other Chemicals

CO2 (liquid) (CO2)

Primers

HMDS ([(CH3)3Si]2NH)

Solvents

Isopropanol

Bases

KOH (KOH)

Resist Remover

PRS-1000
SRS-100
Last modified: 11 Aug 2025
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