9:1 Piranha Solution | Stanford Nanofabrication Facility

Preferred Short Name:

9:1 Piranha

Chemical Formula:

9:1 H₂SO₄:H₂O₂

Full Chemical Name:

9:1 Sulfuric Acid : Hydrogen Peroxide

Piranha solutions are traditionally used for resist removal or as a second cleaning step after a dry resist removal to ensure clean substrates.

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Chemicals	Notes
Wet Bench Clean_res-piranha wbclean_res-piranha	Wet Bench Clean Piranha/HF/Phosphoric Training 2.25 hours	Clean	SNF Paul G Allen L107 Cleanroom	9:1 Piranha	Resist will be removed
Wet Bench Flexcorr 1 wbflexcorr-1	Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours	Flexible	SNF Paul G Allen L107 Cleanroom	Acids Bases Gold Etchant 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.