Overview
The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or cleaning of SNF approved substrates or materials using only SNF approved acids or bases. GaAs processing is allowed but only in user provided labware. Solvents are not allowed!
Processing Technique(s)
- Cleaning > Decontamination
- Cleaning > Metal Clean
- Cleaning > Piranha Cleaning
- Cleaning > Resist Removal > Wet Resist Removal
- Etching > Wet Etching > Acid or Base Wet Etching
- Etching > Wet Etching > Aluminum and Titanium and Tungsten Wet Etching
- Etching > Wet Etching > Silicon Wet Etching
- Etching > Wet Etching > Silicon Oxide Wet Etching
- Wet Chemical Processing
Capabilities and Specifications
Primary Materials Etched
Other Materials Etched
Process Temperature Range:
Chemicals
Substrate Type
Substrate Sizes
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Lab Organization, Location, and NEMO Information
Training and Maintenance
Steps to become a tool user
Become a member of nano@stanford.
Become a member of SNF.
- Study the relevant operating procedures:
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
For upcoming training check the Training dashboard (login required).
- Contact the primary trainer: Uli Thumser