Wet Resist Removal

Wet methods use either solvents or acids/bases to dissolve the resist in order to remove it from the substrate.

The wet bench you need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Piranha Cleaning, Wet Resist Removal, Wet Chemical Processing	Wet Bench Clean_res-piranha wbclean_res-piranha	Wet Bench Clean_res-piranha is part of the 'clean' cleanliness group and is used to clean or remove resist from 3", 4", and 6" silicon, quartz, and silicon germanium wafers using piranha. 2 baths are available and can hold up to 25 wafers.	Clean	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing	Wet Bench Flexcorr 1 wbflexcorr-1	Manual wet etching of non-standard materials using only SNF approved acids or bases. Hot plate available. GaAs allowed in personal labware only.	Flexible	SNF Cleanroom Paul G Allen L107
Solvent Cleaning, Wet Resist Removal, Metal Lift-off	Wet Bench Flexible Solvents wbflexsolv	Manual solvent cleaning of materials in the flexible cleanliness group.	Flexible	SNF Cleanroom Paul G Allen L107
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing	Wet Bench Flexible Solvents 1 wbflexsolv-1	Manual solvent cleaning, two ultrasonic baths.	Flexible	SNF Cleanroom Paul G Allen L107
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing	Wet Bench Flexible Solvents 2 wbflexsolv-2	Manual solvent cleaning and resist removal, hot plate.	Flexible	SNF Cleanroom Paul G Allen L107
Wet Resist Removal, Wet Chemical Processing	Wet Bench Resist Strip wbresstrip-1	Wet bench to remove resist using SRS-100 or PRS1000.	Clean (Ge), Semiclean, Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Chemicals	Primary Materials Etched	Other Materials Etched	Substrate Size	Maximum Load (number of wafers)	Process Temperature Range	Notes
Piranha Cleaning, Wet Resist Removal, Wet Chemical Processing	Wet Bench Clean_res-piranha wbclean_res-piranha	Clean	9:1 Piranha			3" 4" 6"			Resist will be removed
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Solvent Cleaning, Wet Resist Removal, Metal Lift-off	Wet Bench Flexible Solvents wbflexsolv	Flexible	Solvents			Pieces 2" 3" 4" 6"			Manual solvent cleaning of substrates or resist removal.
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing	Wet Bench Flexible Solvents 1 wbflexsolv-1	Flexible	Solvents			Pieces 2" 3" 4" 6"			Manual solvent cleaning, two ultrasonic baths.
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing	Wet Bench Flexible Solvents 2 wbflexsolv-2	Flexible	Solvents			Pieces 2" 3" 4" 6"			Manual solvent cleaning, hot plate
Wet Resist Removal, Wet Chemical Processing	Wet Bench Resist Strip wbresstrip-1	Clean (Ge), Semiclean, Flexible	PRS-1000 SRS-100	Resist		Pieces 2" 3" 4"	25 4 inch wafers	20 °C - 60 °C	Wet Resist Removal: SRS-100 or PRS1000

Techniques

Wet Resist Removal

Technique Tabs