Overview
The Solvent Wet Bench is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects such as equipment parts. The bench is equipped with a carboy to collect solvent waste , two ultrasonic baths, one hot plate for heating solvents in beakers, and a N2 gun for drying.
Processing Technique(s)
Capabilities and Specifications
Process Temperature Range:
Chemicals
Substrate Type
Substrate Sizes
Manual solvent cleaning, two ultrasonic baths.
Lab Organization, Location, and NEMO Information
Training and Maintenance
Steps to become a tool user
Become a member of nano@stanford.
Become a member of SNF.
- Study the relevant operating procedures:
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
For upcoming training check the Training dashboard (login required).
- Contact the primary trainer: Uli Thumser