Tungsten (W) etchant Peroxide-based (H2O2)
Preferred Short Name:
W-etch
Chemical Formula:
H2O2
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
|---|---|---|---|---|---|
|
Wet Bench CMOS Metal wbclean3 |
Wet Bench CMOS Metal (wbclean3) Training | SNF Paul G Allen L107 Cleanroom |
Al, Ti, or W wet etching or oxide etching |