PMMA
Chemical Formula:
(C5O2H8)n
Full Chemical Name (for In-Use Hazardous Chemicals card):
Polymethyl methacrylate
PMMA can be used as a negative photoresist.
| Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
|---|---|---|---|---|---|
|
Headway Manual Resist Spinner headway2 |
Resist Coat (manual) Headway Manual Training 1.00 hours |
SNF Cleanroom Paul G Allen L107 |
|
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
|
|
Laurell Manual Resist Spinner laurell-R |
Laurell Manual Resist Spinner Training 1.00 hours |
SNF Cleanroom Paul G Allen L107 |
SU-8, LOL, Ebeam resists allowed. No Acetone allowed. |
