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Laurell Manual Resist Spinner (laurell-R)

Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Lithography Specifications

Notes: 

SU-8, LOL, Ebeam resists allowed. No Acetone allowed. 

Lab Organization, Location, and NEMO Information

NEMO Area: 
SNF: Photolithography
NEMO ID: 
laurell-R

Training and Maintenance

Lab Facility: 
Training Charges: 
1.00 hours
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
  2. Study the relevant operating procedures:
  3. Contact the primary trainer: Michael Robles

Operating Instructions