Laurell Manual Resist Spinner (laurell-R)
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lithography Specifications
Resist:
Chemicals
Substrate Sizes
Notes:
SU-8, LOL, Ebeam resists allowed. No Acetone allowed.
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Photolithography
NEMO ID:
laurell-R
Training and Maintenance
Lab Facility:
Training Charges:
1.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
- Contact the primary trainer: Cliff Knollenberg
