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Laurell Manual Resist Spinner (laurell-R)


Processing Technique(s)

Capabilities and Specifications

Lithography Specifications


SU-8, LOL, Ebeam resists allowed. No Acetone allowed. 

Lab Organization, Location, and NEMO Information

NEMO Area: 
SNF: Photolithography

Training and Maintenance

Lab Facility: 
Training Charges: 
1.00 hours
Primary Trainer: 
Backup Trainer(s): 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. "All Litho" class is required before training on any of the lithography tools. Please send an email to to sign up for the All Litho class. Read more here: All Litho class.
  2. Study the relevant operating procedures:
  3. Contact the primary trainer: Cliff Knollenberg

Operating Instructions