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Spin coat substrates with graphene

PROM Request Title: 
Spin coat substrates with graphene
PROM Request Summary: 
Request to use Headway spinner in SNF to spin coat graphene particles on substrates.
PROM Date: 
02/11/2014
PROM Decision: 
Approved for Laurell spinner OUTSIDE of SNF. No loose nanoparticles to be spun inside of cleanroom.
Link to PROM Request and supporting documentation: 
Spin coat substrates with graphene
Equipment List: 
Headway Manual Resist Spinner (headway2)
Laurell Manual Resist Spinner (laurell-R)