Skip to content
Skip to navigation
Stanford Nanofabrication Facility
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Guide Home
Guide Home Overview
Lab Spaces
Techniques
Overview
Processing Techniques
Projects
Nano Nuggets
Processes
Runsheets
Safety & Policies
Overview
SNF Lab Manual
Safety Training
SDS
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
Training
Overview/Equipment List
Upcoming Training, link to NEMO
Training Course Online
Training Shadowing Form
Training Videos
All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
New Process or Material Requests (PROM)
Chemicals List
Materials List
Gases List
Useful Links
Run NEMO (login required)
NEMO User Guide
Events
External Links
Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
Tool Monitoring
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Cliff Knollenberg
Contact Information
Phone:
(650)721-1274
Office:
Paul G. Allen 136
Email:
cknollen@stanford.edu
About
Role:
Process Engineer for Litho
Technical Liaison for:
Etching, MEMS, Optics, Process integration
Trainer for
ASML PAS 5500/60 i-line Stepper (asml)
EVG 101 Spray Coater (evgspraycoat)
EVG Contact Aligner (evalign)
Flexus 2320 Stress Tester (stresstest)
Headway Manual Resist Spinner (headway2)
HMDS Vapor Prime Oven, YES (yes)
Nanospec 3 (nanospec3)
Oven (White) (white-oven)
Oven 110°C post-bake (oven110)
Oven 90°C prebake (oven90)
Oven BlueM 200°C to 430°C (bluem)
SEM -Zeiss Merlin (sem-merlin)
Ultraviolet Photoresist Cure (uvcure)
Backup trainer for
Ex Fab Develop Wet Bench (wbexfab_dev)
Ex Fab Solvent Wet Bench (wbexfab_solv)
Headway 3 Manual Resist Spinner (headway3)
HMDS Vapor Prime Oven, YES2 (yes2)
Karl Suss MA-6 Contact Aligner (karlsuss)
Karl Suss MA-6 Contact Aligner (karlsuss2)
Laurell Manual Resist Spinner (laurell-R)
Mask Scrubber (masksrub)
Nanospec 210XP (nanospec2)
Oxford Dielectric Etcher (oxford-rie)
Oxford III-V etcher (Ox-35)
Oxford Plasma Pro ICP-RIE (Ox-gen)
Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE)
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)
PlasmaTherm Versaline HDP CVD System (hdpcvd)
Profilometer Alphastep 500 (alphastep)
Profilometer AlphaStep D-300 (alphastep2)
Prometrix Resistivity Mapping System (prometrix)
Reflectance Spectrometer Filmetrics F40 (filmetrics)
Samco PC300 Plasma Etch System (samco)
Sensofar S-neox (s-neox)
SVG Develop Track 1 (svgdev)
SVG Develop Track 2 (svgdev2)
SVG Resist Coat Track 1 (svgcoat)
SVG Resist Coat Track 2 (svgcoat2)
Wet Bench Miscellaneous (wbmiscres)
Wet Bench Solvent Lithography (lithosolv)