ASML PAS 5500/60 i-line Stepper (asml)
Overview
The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm* wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of 450nm and alignment between lithographic layers of 90nm. The stepper uses 5X reduction imaging allowing a maximum die area of 18mm by 22.4mm per exposure.
*150mm capable with advanced notice. Requires approval and additional conversion fee
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lithography Specifications
Substrate Type
Substrate Sizes
Notes:
5:1 reducing stepper
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Photolithography
NEMO ID:
asml
Training and Maintenance
Lab Facility:
Training Charges:
4.00 hours
Primary Trainer:
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Cliff Knollenberg
Notes:
Job Writing: 2 hours and Tool Training: 2 hours
