Mix and Match: E-beam and Optical Lithography for Optical Gratings and Waveguide

Project Type:

E241

Date:

June 2011 (all day)

Areas of Interest:

Mixing Optical and E-beam Lithography

Report:

Mix-and-Match: E-beam and Optical Lithography for Optical Gratings and Waveguides- Final Report

Processing Technique (former Function and Method):

Patterning

Researchers and (Mentors):

Chia-Ming Chang

List of Important Equipment:

ASML PAS 5500/60 i-line Stepper (asml)