Project Type: 
E241
Date: 
June 2015 (all day)
Areas of Interest: 
MOCVD, ASML, double exposure, JEOL, InSb, Ox III-V
Report: 
Vertical Semiconductor Blades- Final Report
Processing Technique (former Function and Method): 
Reactive Ion Etching (RIE)
Photolithography
Researchers and (Mentors): 
Martin Winterkorn, Anup Dadlani, Karen Kim, (J Provine)
List of Important Equipment: 
ASML PAS 5500/60 i-line Stepper (asml)
Aixtron MOCVD - III-N system (aix-ccs)
Oxford III-V etcher (Ox-35)
Presentation: 
Vertical Quantum Confinement Structures- Final Presentation