Headway 3 Manual Resist Spinner (headway3)
Overview
The Headway Coater is used to manually apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time substrate and fluid properties of the photoresist determine the final thickness of the film.
Once you are trained on the tool, please join the tool discussion list. The instruction and the lists are located at https://snfexfab.stanford.edu/snf/join/discussion-lists
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lithography Specifications
Substrate Sizes
Maximum Load:
1 piece or wafer
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
nSiL: L104 Stinson
NEMO ID:
headway3
Training and Maintenance
Lab Facility:
Training Charges:
1.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Send an email to the primary contact with date and time of shadowing and cc the person you have shadowed.
- Contact the primary trainer: Swaroop Kommera
- Headway 2 and 3 are trained together.
