Direct laser writing of a negative photoresist (mr-DWL 100)
PROM Request Title:
Direct laser writing of a negative photoresist (mr-DWL 100)
PROM Request Summary:
Approval to use negative resist with standard substrates on Heidelberg.
PROM Date:
03/22/2018
PROM Decision:
Request approved.
Link to PROM Request and supporting documentation:
