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Karl Suss MA-6 Contact Aligner (karlsuss2)



The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low vacuum contact; proximity is not available. Our current configuration accommodates 3", 4" and 6" wafers and pieces. SNF has two MA-6 aligners (karlsuss and karlsuss2).


Processing Technique(s)

Capabilities and Specifications

Lithography Specifications

Minimum Resolution: 
1.50 μm
Exposure Wavelength: 
365 nm or 405 nm
Mask Size: 
Max Exposure Area: 
5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch

1:1 Contact Aligner.
Backside align.

Lab Organization, Location, and NEMO Information

NEMO Area: 
SNF: Photolithography

Training and Maintenance

Lab Facility: 
Training Charges: 
1.50 hours
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. "All Litho" class is required before training on any of the lithography tools. Please send an email to to sign up for the All Litho class. Read more here: All Litho class.
  2. Study the relevant operating procedures:
  3. Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
  4. Contact the primary trainer: Uli Thumser

Operating Instructions