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Contact Aligner

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Contact Aligner	EVG Contact Aligner evalign	1:1 Contact Mask Aligner, 1.5 um resolution, single wafer, manual system	All	SNF Cleanroom Paul G Allen L107
Contact Aligner	Karl Suss MA-6 Contact Aligner karlsuss	Karl Suss MA-6 Mask Aligner is a 1:1 Contact Aligner, 1.5 um resolution, single wafer, manual system (Backside align, including IR).	All	SNF Cleanroom Paul G Allen L107
Contact Aligner	Karl Suss MA-6 Contact Aligner karlsuss2	Karl Suss MA-6 Mask Aligner is a 1:1 Contact Aligner, 1.5 um resolution, single wafer, manual system (Backside align, including IR).	All	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Minimum Resolution	Exposure Wavelength	Substrate Size	Maximum Load (number of wafers)	Mask Size	Notes
Contact Aligner	EVG Contact Aligner evalign	All	1.50 μm	350 - 450 nm	Pieces 2" 3" 4" 6"	one piece or wafer	5 inch, 7 inch	1:1 Contact Aligner. Anodic Bond, backside align, including IR.
Contact Aligner	Karl Suss MA-6 Contact Aligner karlsuss	All	1.50 μm	365 nm	Pieces 2" 3" 4" 6"		4 inch, 5 inch, 7 inch	1:1 Contact Aligner. Backside align, including IR.
Contact Aligner	Karl Suss MA-6 Contact Aligner karlsuss2	All	1.50 μm	365 nm or 405 nm	Pieces 2" 3" 4" 6"		4 inch, 5 inch, 7 inch	1:1 Contact Aligner. Backside align.