Nanospec 210XP (nanospec2)
Overview
The Nanometrics Nanospec 210XP system uses non-contact, spectro-reflectometry (measurement of the intensity of reflective light as a function of incident wavelength) to determine the thickness of transparent films (up to two) on substrates, such as silicon, that are reflective in the visible range.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Substrate Type
Substrate Sizes
Notes:
Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Characterization and Testing
NEMO ID:
nanospec2
Training and Maintenance
Lab Facility:
Training Charges:
0.25 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Swaroop Kommera
