Overview
Exfab solvent wet bench is for wet chemical processing with solvents of standard and non-standard materials (flexible) like glass and standard/non-standard metals for pieces and wafers up to 6 inch. Headway 3 is for spinning resist or other materials (non-standard resists and materials need to be approved prior to spinning in Headway 3). The Equipment Group is determined by the cleanliness of the labware. This wetbench contains Headway3, two hot plates for post resist spin processing, one explosion proof hot plate, one ultrasonic bath and there is room for manual processing in beakers.
Processing Technique(s)
Capabilities and Specifications
Process Temperature Range:
Chemicals
Substrate Sizes
Lab Organization, Location, and NEMO Information
Training and Maintenance
Steps to become a tool user
Become a member of nano@stanford.
Become a member of SNF.
"All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Swaroop Kommera