The wbexfab_dev wet bench is primarily used for developing of photoresist. No solvents may be used here. Please use solvent wet bench for SU8 development. The bench is equipped with an automatic dump rinser (QDR), two N2 guns, 2 DI hand sprayers, a rinse sink with a gooseneck and a drain, an aspirator and a glove rinsing station.
Manual development of resist in beakers. SNF approved developers only. No solvents!