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Resist Develop (manual)

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Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Resist Develop (manual), Wet Chemical Processing	Ex Fab Develop Wet Bench wbexfab_dev	Manual developing of photoresist using mainly MF-26A.	Flexible	SNF Exfab Paul G Allen 104 Stinson
Resist Develop (manual), Wet Chemical Processing	Wet Bench Miscellaneous wbmiscres	Manual developing of photoresist using mainly AZ1:1 developer.	Flexible	SNF Paul G Allen L107 Cleanroom

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Chemicals	Substrate Size	Developer	Notes
Resist Develop (manual), Wet Chemical Processing	Ex Fab Develop Wet Bench wbexfab_dev	Flexible		Pieces 2" 3" 4" 6" 8" 12" Cones Disks Other	AZ 1:1 MF-26A developer	Manual development of resist in beakers. SNF approved developers only. No solvents!
Resist Develop (manual), Wet Chemical Processing	Wet Bench Miscellaneous wbmiscres	Flexible	Developers	Pieces 2" 3" 4" 6"	AZ 1:1	Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!