Overview
The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a gooseneck, DI hand sprayer, and two N2 guns. There are two spin/rinse dryers located to the left of the bench for 4 or 6 inch wafers. The headway manual spinner is mounted on the right side of the bench top.
Processing Technique(s)
Capabilities and Specifications
Process Temperature Range:
Lithography Specifications
Chemicals
Substrate Type
Substrate Sizes
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!
Lab Organization, Location, and NEMO Information
Training and Maintenance
Steps to become a tool user
Become a member of nano@stanford.
Become a member of SNF.
"All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Michael Robles