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Stanford Nanofabrication Facility
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Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
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Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
Operating Instructions
Filmetrics
Reflectance Spectrometer Filmetrics F40 (filmetrics)
Cleanliness:
All
Processing Technique(s)
Characterization
>
Reflectometry
Capabilities and Specifications
Maximum Load:
one piece or wafer
Lab Organization, Location, and NEMO Information
Lab Organization:
Stanford Nanofabrication Facility (SNF)
Location:
SNF Cleanroom Paul G Allen L107
NEMO Area:
SNF: Characterization and Testing
NEMO ID:
filmetrics
Training and Maintenance
Lab Facility:
SNF
Primary Trainer:
Swaroop Kommera
Backup Trainer(s):
Cliff Knollenberg
Primary Maintenance:
Gary Sosa
Backup Maintenance:
Mario Vilanova
Steps to become a tool user
Become a
member of SNF
.
Contact the primary trainer:
Swaroop Kommera
Operating Instructions
Filmetrics