Overview

SVGdev1 back track

The SVG (Silicon Valley Group) developer is an automated system with two independent tracks (svgdev and svgdev2) for developing and post-baking exposed photoresist-coated 4" wafers. Each track system includes two stations: a spin station which dispenses developer and rinses with DI water; and an oven station for post-bake.

Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Process Temperature Range:

Lithography Specifications

Developer: 

Substrate Sizes

Maximum Load: 
25 4 inch wafers
Notes: 

Automatic development.

Lab Organization, Location, and NEMO Information

Training and Maintenance

Lab Facility: 
Training Charges: 
0.50 hours
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of nano@stanford.

  2. Become a member of SNF.

  3. "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.

  4. Study the relevant operating procedures:
  5. Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF

  6. During shadowing, use the SVG developer check list.

  7. Contact the primary trainer: Rachelle Salmani