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Resist Develop (automatic)

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Resist Develop (automatic)	SVG Develop Track 1 svgdev	Automatic resist development of 4" wafers in cassette holding up to 25 wafers.	All	SNF Cleanroom Paul G Allen L107
Resist Develop (automatic)	SVG Develop Track 2 svgdev2	Automatic resist development of 4" wafers in cassette holding up to 25 wafers.	All	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Substrate Size	Maximum Load (number of wafers)	Developer	Notes
Resist Develop (automatic)	SVG Develop Track 1 svgdev	All	4"	25 4 inch wafers	MF-26A developer	Automatic development.
Resist Develop (automatic)	SVG Develop Track 2 svgdev2	All	4"	25 4 inch wafers	MF-26A developer	Automatic development.