SVG Resist Coat Track 1 (svgcoat)
Overview
The SVG (Silicon Valley Group) coater is an automated track system for dispensing photoresist on 4" silicon, glass, or quartz wafers. The system includes two stations: a prime oven which bakes the wafer and dispenses the adhesion promoter, HMDS; and a combination spinner, which dispenses photoresist, and pre-bake oven which cures the resist. HMDS is only available at track 2. The uniformity of spun photoresists are typically +/- 100 Å.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lithography Specifications
Substrate Type
Substrate Sizes
Maximum Load:
25 4 inch wafers
Notes:
Automatic Resist spinning and bake
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Photolithography
NEMO ID:
svgcoat
Training and Maintenance
Lab Facility:
Training Charges:
1.25 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- During shadowing, use this SVG coat check list.
- Check the NEMO Training Dashboard for upcoimng training sessions (login required).
- Contact the primary trainer: Uli Thumser
