The lithosolv wet bench is used for handling solvents or other volatile organics such as photoresist. Processes performed here include mask and substrate cleaning and pouring resist into smaller containers for manual dispensing. Acids and bases (namely, developers) must never be handled here. Liquid waste is collected locally. A solid hazardous waste under the benchtop is used to collect cleanroom wipes, vinyl gloves, swabs, and other solid materials which may be contaminated with solvents and photoresist. SU8 development allowed.
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.