PROM Request Title: 
Orthogonal lithography of organic thin films
PROM Request Summary: 
Request to use Orthogonal photoresist in SNF
PROM Date: 
03/28/2019 (all day)
PROM Decision: 
No appropriate spin coater in SNF, user found capability at SNSF
Link to PROM Request and supporting documentation: 
Orthogonal lithography of organic thin films
Equipment List: 
Headway Manual Resist Spinner (headway2)
Heidelberg MLA 150 (heidelberg)
Wet Bench Solvent Lithography (lithosolv)
Wet Bench Flexible Solvents (wbflexsolv)