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Characterization (link to Processing Techniques)
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Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Wet Chemical Processing (link to Processing Techniques)
Ultraviolet Photoresist Cure (uvcure)
Overview
primary wavelength: 254 nm
Cleanliness:
All
Processing Technique(s)
Photolithography
>
Resist Bake
>
Oven Bake
>
Resist UV Cure
Capabilities and Specifications
Lithography Specifications
Exposure Wavelength:
254 nm
Lab Organization, Location, and NEMO Information
Lab Organization:
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location:
SNF Cleanroom Paul G Allen L107
NEMO Area:
SNF: Photolithography
NEMO ID:
uvcure
Training and Maintenance
Lab Facility:
SNF Cleanroom
Primary Trainer:
Cliff Knollenberg
Primary Maintenance:
Mario Vilanova
Backup Maintenance:
Gary Sosa
Steps to become a tool user
Become a
member of SNF
.
"All Litho" class is required before training on any of the lithography tools. Please send an email to
all-litho-training@lists.stanford.edu
to sign up for the All Litho class. Read more here:
All Litho class
.
Contact the primary trainer:
Cliff Knollenberg