The wbclean_res-hotphos is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Equipment Group for 3", 4", and 6" Si, SiGe, and quartz substrates and can only be used for wet silicon nitride etching. Wafers may not contain or have ever contained any metals, nor been exposed to equipment which may pose this contamination risk. This part of the bench contains one hot pot for phosphoric acid and one automatic dump rinser.
Resist should have been removed
covered in wbclean-1 and-2