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Silicon Nitride Wet Etching

Heated phosphoric acid is used for removal of silicon nitrides.

Link to Silicon Nitride Wet Etch, clean, module

Link to Silicon Nitride Wet Etch, flexible, module

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Silicon Nitride Wet Etching, Wet Chemical Processing	Wet Bench Clean_res- hotphos wbclean_res-hotphos	Semi-automated wet bench for etching silicon nitride from 3", 4", and 6" Si, SiGe, and quartz substrates using 155C phosphoric acid. The baths can hold up to 25 wafers. Part of the Clean Cleanliness Group.	Clean	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Primary Materials Etched	Substrate Size	Notes
Silicon Nitride Wet Etching, Wet Chemical Processing	Wet Bench Clean_res- hotphos wbclean_res-hotphos	Clean	Si3N4	3" 4" 6"	Resist should have been removed