Heated phosphoric acid is used for removal of silicon nitrides. 

Link to Silicon Nitride Wet Etch, clean, module

Link to Silicon Nitride Wet Etch, flexible, module

Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Location
Silicon Nitride Wet Etching, Wet Chemical Processing Wet Bench Clean_res- hotphos
wbclean_res-hotphos

Semi-automated wet bench for etching silicon nitride from 3", 4", and 6" Si, SiGe, and quartz substrates using 155C phosphoric acid. The baths can hold up to 25 wafers. Part of the Clean Cleanliness Group.

 Clean SNF Paul G Allen L107 Cleanroom