Prometrix Resistivity Mapping System (prometrix)
Overview
The Prometrix OmniMap Model RS35e Resistivity Mapping System collects and analyzes sheet resistance data on various conductive layers such as implants, diffusions, epi, metals and bulk substrates. The system provides accurate and repeatable sheet resistance measurements from 5 m ohm/sq to 5 M ohm/sq on 2-inch ( 50mm) to 8-inch (200mm) wafers. The OmniMap measures up to 1264 sites per wafer using standard or user-defined patterns.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Substrate Type
Substrate Sizes
Maximum Load:
1
Notes:
3 Probe Heads for different cleanliness groups.
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Characterization and Testing
NEMO ID:
prometrix
Training and Maintenance
Lab Facility:
Training Charges:
0.50 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Uli Thumser
