Wet Bench Decontamination (wbdecon)
Overview
This part of the bench (left side), wbdecon, has one HCl bath, dump rinser, and SRD for the decontamination of 3", 4" or 6 " KOH-etched silicon wafers before being allowed back into the clean equipment group.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Chemicals
Substrate Type
Substrate Sizes
Notes:
KOH or wafersaw or post-cmp decontamination
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Wet Benches
NEMO ID:
wbdecon
Training and Maintenance
Lab Facility:
Primary Trainer:
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Please read the 'KOH decontamination at wbdecon' part of this page.
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Uli Thumser
