Overview

The Filmetrics 4PP is replacing the Prometrix OmniMap Model RS35e Resistivity Mapping System.

Please contact Swaroop Kommera.

Processing Technique(s)

Capabilities and Specifications

Substrate Sizes

2 inch wafer
3 inch wafer
4 inch wafer
6 inch wafer
8 inch wafer
Maximum Load: 
1
Notes: 

3 Probe Heads for different cleanliness groups.

Lab Organization, Location, and NEMO Information

Lab Organization: 

Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)