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Silicon Germanium

Chemical Formula:

SiGe

A deposited layer of SiGe. The ratio of Si to Ge can be controlled and will vary depending on the application.

Equipment Tabs

Annealing & Oxidation Equipment

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
AMAT Centurion Epitaxial System epi2	Clean	SNF Cleanroom Paul G Allen L107	50.00 Å - 3.00 μm	Ge Si SiGe

Deposition Equipment

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
AMAT Centurion Epitaxial System epi2	Clean	SNF Cleanroom Paul G Allen L107	50.00 Å - 3.00 μm	Ge Si SiGe
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly	Flexible	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	Ge Si Si SiGe

Etching Equipment

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si Si3N4 SiGe SiO₂ SiON	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten
Lam Research TCP 9400 Poly Etcher lampoly	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Si	Ge SiGe
Xactix Xenon Difluoride Etcher xactix	All	SNF Cleanroom Paul G Allen L107	Ge Si SiGe

Projects