Chemical Formula:
Ga2O3
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Fiji 2 ALD fiji2 |
SNF Paul G Allen L107 Cleanroom |
1.00 Å -
50.00 nm
|
||
|
Savannah ALD savannah |
SNF Paul G Allen L107 Cleanroom |
1.00 Å -
50.00 nm
|
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched |
|---|---|---|---|---|
|
MRC Reactive Ion Etcher mrc |
SNF Paul G Allen L107 Cleanroom |
|