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Tantalum Pentoxide

Chemical Formula: 
Ta2O5

Equipment Tabs

Deposition Equipment
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Location Material Thickness Range Approved Materials supplied by Lab
Fiji 1 ALD
fiji1
SNF Cleanroom Paul G Allen L107
1.00 Å - 50.00 nm
Fiji 2 ALD
fiji2
SNF Cleanroom Paul G Allen L107
1.00 Å - 50.00 nm
Projects
Developing a standard recipe of thermal ALD Tantalum Pentoxide(Ta2O5) film- Final Presentation -- (Presentation)
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