Chemical Formula:
SiON
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Oxford Plasma Pro PECVD Ox-PECVD |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
PlasmaTherm Shuttlelock PECVD System ccp-dep |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
PlasmaTherm Versaline HDP CVD System hdpcvd |
SNF Paul G Allen L107 Cleanroom |
500.00 Å -
4.00 μm
|
||
|
Tystar Bank 2 Tube 7 Nitride B2T7 Flexible Nitride |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|
||
|
Tystar Bank 3 Tube 10 Nitride B3T10 Clean Nitride |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched |
|---|---|---|---|---|
|
MRC Reactive Ion Etcher mrc |
SNF Paul G Allen L107 Cleanroom |
|
||
|
Oxford Plasma Pro ICP-RIE ALE Ox-ALE |
SNF Paul G Allen L107 Cleanroom | |||
|
Samco PC300 Plasma Etch System samco |
SNF Paul G Allen L107 Cleanroom |