Oxford Plasma Pro ICP-RIE ALE (Ox-ALE)
Overview
Oxford ICP-RIE Atomic Layer Etching (OX-ALE) is an Inductively Coupled Plasma (ICP) etch system designed for high-precision etching of silicon-based materials, III-V semiconductors, and 2D materials. It utilizes chlorine (Cl₂) and fluorine (F) chemistries for atomic layer etching. The tool is housed in the SNF Cleanroom and supports single-wafer processing of 4", 6", and 8" wafers. It features a load-lock system and is classified under the “flexible” cleanliness group within SNF.
PlasmaTherm Oxide Etcher (PT-OX) is an ICP (Inductively Coupled Plasma) etch system configured for the etching of oxide and deep glass/quartz , using F chemistry, located in the SNF Cleanroom. It is a single wafer etcher for 4 or 6 inch wafers, with a load lock, and is in the “flexible” cleanliness group in SNF.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Primary Materials Etched
Other Materials Etched
Process Temperature Range:
0 °C - 40 °C
Gases
Substrate Type
Substrate Sizes
Maximum Load:
1
Lab Facility, Location, and NEMO Information
Location:
NEMO Area (ExFab by room):
NEMO ID:
Ox-ALE
Training and Maintenance
Lab Facility:
Training Charges:
1.50 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Online Course for general information about the online training. Go to Online Nano Course Login to log in directly to the course.
Go to "nano@stanford" and then to the "Dry Etching" section for the three videos on plasma etching principles and to "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment. - Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Lavendra Mandyam
