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Lavendra Mandyam
Contact Information
Phone:
(650)498-1304
Office:
Paul G. Allen 145
Email:
lavendra@stanford.edu
About
Role:
Process Engineer - Dry Etching
Technical Liaison for:
Etching, MEMS, Plasma deposition
Trainer for
AMAT P5000 Etcher (p5000etch)
Gasonics Aura Asher (gasonics)
Lam Research TCP 9400 Poly Etcher (lampoly)
Matrix Plasma Resist Strip (matrix)
MRC Reactive Ion Etcher (mrc)
Oxford Dielectric Etcher (oxford-rie)
Oxford III-V etcher (Ox-35)
Oxford Plasma Pro ICP-RIE (Ox-gen)
Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE)
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)
Plasmaetch PE-50 (plasma-etch)
PlasmaTherm Shuttlelock PECVD System (ccp-dep)
PlasmaTherm Versaline HDP CVD System (hdpcvd)
Samco PC300 Plasma Etch System (samco)
Technics Asher (technics)
Xactix Xenon Difluoride Etcher (xactix)
Backup trainer for
SEM -Zeiss Merlin (sem-merlin)
SPTS uetch vapor etch (uetch)
Backup maintenance for
Oxford Plasma Pro ICP-RIE (Ox-gen)
SPTS uetch vapor etch (uetch)
