Technics Asher (technics)
Overview
Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma at ambient temperature. It is a planar etch system with 30kHz generator and upto 500W. No magnetic materials are allowed in this system.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Primary Materials Etched
Other Materials Etched
Gases
Substrate Type
Substrate Sizes
Maximum Load:
Four 4" wafers to pieces, one 6" or 8" wafer
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Dry Etching
NEMO ID:
technics
Training and Maintenance
Lab Facility:
Training Charges:
0.50 hours
Primary Trainer:
Primary Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- Study the relevant operating procedures:
- Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or SNF usage to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
- Contact the primary trainer: Lavendra Mandyam
